Research Scientist - Plasma Modeling - Albany NY

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:text,ActualValueFromSolar:null},{QuestionName:Job Description,AnswerValue:The brightest of the bright. Our scientists at TEL Technology Center, America, LLC. work to integrate new and innovative technology into the products and tools we currently have as well as develop new tools to streamline our current processes. We are a representation of TEL’s world-class technology, enabling us to move to the forefront of today’s marketplace. Utilizing original Ru0026D strategies and processes has fully equipped us with the capability to provide unparalleled service systems that have been utilized on a global scale.u003cbr/u003eu003cbr/u003eSummary: u003cbr/u003ePerform chamber scale plasma modeling to test and optimize plasma properties to assist new hardware design in etch chambers. Work on zero to 3D profile modeling to optimize current etch process conditions and propose new operation regimes or process conditions. Collaborate with headquarter customer support and Ru0026D teams to pursue possible solutions for any critical issues that chip makers are currently facing and will be facing in the near future. Conduct basic etch process development work to validate modeling assumptions in a clean room environment. u003cbr/u003eResponsibilities: u003cbr/u003e • Contribute as a vital team member of the modeling team focusing on semiconductor related research and development projects u003cbr/u003e • Interact and collaborate with other scientists and engineers to identify potential issues and subsequent solutions u003cbr/u003e • Build chemical models to better understand and optimize vapor and plasma etch processes u003cbr/u003e • Responsibilities include early recognition of industry trends, identification of key etching problems for future nodes, proposing novel solutions, and developing/managing complex interdisciplinary projects u003cbr/u003e • Communicate project goals and statuses both internally and externally at customer sites, conferences and consortia workshops u003cbr/u003eu003cbr/u003eu003cbr/u003eQualifications:u003cbr/u003e• PhD in Electrical Engineering, Chemistry, Physics, Material Science or related Engineering Fields with graduate training on chamber and/or feature scale plasma modeling. u003cbr/u003e• 3 years Semiconductor Etch plasma/process modeling experience (HPEM, CFD-ACE , VizGlow etc.) is required.u003cbr/u003e• Background in process characterization and data analysis including design of experiment [DOE] is desired.u003cbr/u003e• Excellent verbal and written communication skills. Fluent in English.u003cbr/u003e• Be able to work in teams as well as individually. Ability and desire to work as a part of a multicultural team.u003cbr/u003e• Some travel, u003c20% is required in year 3 and beyond.u003cbr/u003eu003cbr/u003eu003cbr/u003e u003cbr/u003eu003cbr/u003eu003cbr/u003eEqual Opportunity Employer/Minorities/Females/Disabled/Veteransu003cbr/u003eu003cbr/u003eu003cbr/u003ePhysical Demands and Work Conditionsu003cbr/u003eThe physical demands described herein are representative of those that must be met by an employee to successfully perform the essential functions of this job. This job operates in an office setting. This role routinely uses standard office equipment such as computers, phones, photocopiers, and filing cabinets. This is a largely sedentary role; however, some filing is required, which would require the ability to lift files, open filing cabinets and bend or stand as necessary. This position requires the ability to occasionally lift office products and supplies, up to 35 pounds. This position also requires 4 to 6 hours per day at a computer screen/keyboard. u003cbr/u003eu003cbr/u003eDiversity creates an innovative culture.  TEL US is an Equal Employment Opportunity / Affirmative Action employer and all qualified applicants will receive consideration for employment without regard to race, color, religion, sex, age, national origin, protected veteran status, disability status, sexual orientation, gender identity or expression, marital status, genetic information, or any other characteristic protected by law.u003cbr/u003eu003cbr/u003eEqual Opportunity Employer/Minorities/Females/Disabled/Veterans,VerityZone:jobdescription,QuestionType:textarea,ActualValueFromSolar:null},{QuestionName:State/Province,AnswerValue:NY,VerityZone:formtext3,QuestionType:single-select,ActualValueFromSolar:null},{QuestionName:City,AnswerValue:Albany,VerityZone:formtext4,QuestionType:single-select,ActualValueFromSolar:null},{QuestionName:Subsidiary,AnswerValue:TEL Manufacturing and Engineering of America, Inc. ,VerityZone:formtext5,QuestionType:single-select,ActualValueFromSolar:null}],GQId:2078,isGQResponsive:true,isActive:true,isSocialReferralJobRestricted:false,localeId:1033,AutoOptionalReqId:7362BR,Title:Research Scientist - Plasma Modeling - Albany, NY,JobSiteId:5075,Link:****{Responsive_AdvancedCSS: /*#N#GUIDELINES#N##N#• Enter CSS here.#N##N#• Please take care not to compromise accessibility including color contrast.#N##N#• Please test all window widths so that all responsive break-points remain in tact.#N##N#• Please refer to attributes of the body tag to limit the scope of your rules to a single workflow, or else be sure to check each individual workflow.#N#*/#N##N#.pageHeaderContainer a {#N##T#outline:0;#N#}#N#.primaryButton {#N##T#color:#fff !important;#N#}#N#@media screen and (min-width:769px) {#N##T#div.pageHeaderContainer {#N##T##T#width:100%;#N##T##T#margin-bottom:30px;#N##T##T#border-bottom-style:solid;border-bottom-width:1px;border-color:#E2E2E2;#N##T#}#N##T#div.pageHeader {#N##T##T#border-bottom-style:solid;border-bottom-width:1px;border-color:#E2E2E2;#N##T#}#N##T##headerLinkContainer {#N##T##T#white-space:nowrap;#N##T##T#margin:0 auto 0px auto; 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